Zyvex of the United States has created a chip with a line width of 0.7nm, which is equivalent to the width of 2 silicon atoms.

While ASML's EUV lithography machine is still struggling to manufacture 2nm and 1nm chips, an American company has made a breakthrough in another advanced lithography direction. Zyvex uses electron beam lithography technology to manufacture 768 picometers, or 0.7nm chips, which can be used in quantum computers.

The lithography system launched by Zyvex is called ZyvexLitho1. It is based on the STM scanning tunneling microscope and uses EBL electron beam lithography to produce chips with a line width of 0.7nm. This precision is much higher than that of the EUV lithography system, equivalent to the width of 2 silicon atoms. It is the lithography system with the highest manufacturing precision currently.

The chips produced by this lithography machine are mainly used in quantum computers. It can produce high-precision solid-state quantum devices, as well as nanodevices and materials. Precision is very important for quantum computers.

ZyvexLitho1 is not only the most precise electron beam lithography machine, but also commercially available. Zyvex can already accept orders from others, and the machine can be shipped within 6 months.

The accuracy of EBL electron beam lithography machines can easily exceed that of EUV lithography machines. However, the disadvantages of this technology are also obvious, that is, the output is very low and chips cannot be manufactured on a large scale. It is only suitable for producing small batches of high-precision chips or devices. It is unrealistic to expect them to replace EUV lithography machines.