On May 8, it was reported that ASML's most advanced EUV lithography machine orders this year have been monopolized by Intel, with the price of a single unit exceeding 2.5 billion yuan.
It is reported that the order for ASML's most advanced EUV equipment by the first half of next year has been contracted by Intel, and the five sets of equipment planned to be produced this year will all be shipped to the US chip manufacturer.
According to sources, since the production capacity of the above-mentioned EUV equipment is about 5 to 6 units per year, this means that Intel will obtain all the initial inventory.
This also means that Intel's competitors Samsung and SK Hynix are not expected to obtain the equipment until the second half of next year.
The High-NA EUV lithography machine can etch lines only 8nm wide on semiconductors, which is 1/1.7 of the previous generation.
Thinner lines mean chips can pack more transistors, enabling faster processing and higher storage capacity, which is critical for artificial intelligence workloads.
This EUV arrived at its D1X factory in Oregon at the end of last year, and Intel plans to start using the system for production at the end of 2025.
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