Layout Design of Microarray Accelerometer

Layout design of microarray acceleration sensor
Layout design of microarray acceleration sensor is dependent on the research of sensor array layout. According to the above regression analysis method, the effective layout of sensors in the factor space is determined, so that effective and sufficient information about the acceleration field of the research object can be obtained with fewer sensors.
With the help of orthogonal regression design, the layout design of sensor array in linear and nonlinear conditions is studied:
1)
After orthogonal experiments and regression analysis in linear conditions, the experiment is arranged according to the orthogonal table. The two-level orthogonal table is shown in Table 1.
The layout shown in Figure 1 consists of 8 cantilever beams on the 3 mm×3 mm chip plane, and there is a deformation resistor on the root of each cantilever beam. The center points of the deformation resistors are on the same plane, 4 of which are at the vertices, and the other 4 are the midpoints of the four sides of the square, and the 8 points form a square figure.
2) The nonlinear situation
is studied by theoretical analysis, calculation and experimental research, and its experimental data are shown in Table 2.
The layout shown in Figure 2 is composed of 8 cantilever beams engraved on the 3 mm×3 mm chip plane, and there is a deformation
resistor . The center of the deformation resistor is located on the same plane circumference, and its position is at the point where the same circumference is divided into 8 equal parts.
Table 1 Two-level orthogonal
table Table 2 Experimental values ​​of each point

Fig.1 Layout of microarray acceleration sensor for linear situationFig.2  Layout of microarray acceleration sensor for nonlinear situation 

The process of
manufacturing micro-array acceleration sensor is characterized by the combination of integrated circuit three-dimensional processing technology and two-dimensional processing technology, and the bipolar integrated circuit and sensor body processing technology are compatible. Multiple photolithography and high aspect ratio processing technology are used to control the depth to 50 μm. The process flow chart is shown in Figure 3.

Figure 3 Process flow chart
After multiple photolithography and diffusion processes, the sample was made into a microarray accelerometer with the following parameters:
1) Chip area: 3 mm × 3 mm
2) Test acceleration range: 100 ~ 5 000 g
3) Sensitivity: 0.98 V/g
4) Adaptable ambient temperature: -40 ~ +400 ℃