Training

Location:Training / Circuit Fundamentals / Micro-nano processing (semiconductor manufacturing technology) Swiss Federal Institute of Technology / HF bath for SiO2 and glass wet etching

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HF bath for SiO2 and glass wet etching
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Duration：12 minutes and 27 seconds
Date：2020/05/30

Uploader：桂花蒸

Introduction

keywords： Micro-nano processing UV CVD

This course will demonstrate the most efficient integrated circuit manufacturing processes in a ultra-clean environment to teach the basic principles and processes of semiconductor manufacturing.

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