On January 16, Xinyuanwei released an announcement on the expected increase in annual performance in 2020. The company expects to achieve a net profit attributable to the parent company's owners of 47 million to 53 million yuan in 2020, an increase of 17.7241 million to 23.7241 million yuan compared with the same period last year, an increase of about 60.54% to 81.04% year-on-year.
At the same time, Xinyuanwei's net profit attributable to the parent company's owners after deducting non-recurring gains and losses is RMB 11.5 million to RMB 17 million, which will be a decrease of RMB 3.4327 million to an increase of RMB 2.0673 million compared with the same period last year, a year-on-year decrease of about 22.99% to an increase of about 13.84%.
Regarding the reasons for the performance change, Xinyuan Micro stated that during the reporting period, the semiconductor industry continued to be prosperous, the company actively seized market opportunities, increased market development efforts, and the company's product orders increased rapidly. The full-year operating income in 2020 increased significantly compared with 2019. At the same time, during the reporting period, the company received a listing subsidy of 18 million yuan from the local government, and used idle funds to purchase financial products to obtain investment income of 11.0865 million yuan, which had a certain positive impact on the company's financial statements for this period.
It is worth noting that not long ago, during an investor survey, Xinyuan Micro stated that the technical problems of connecting the company's front-end coating and developing machines with international lithography machines have been overcome and verified, and can be connected with lithography machines of international brands including ASML, Canon, and domestic Shanghai Micro Electronics (SMEE).
When asked whether there are still technical barriers to connecting Xinyuan Micro's front-end resist coating and developing machine Track with international lithography machines, Xinyuan Micro said that the technical problems of connecting the company's front-end resist coating and developing machine with international lithography machines have been overcome and verified, and can be connected with lithography machines of international brands including ASML, Canon, and domestic Shanghai Micro Electronics (SMEE).
Xinyuan Micro said that the main technical difficulty of the coating and developing machine in the process of upgrading Iline, KrF, and ArF technology is that the coating and developing machine has a complex structure and many operating parts. The research and development upgrade has a large technical span, which is mainly reflected in the control of particle pollutants, such as baking accuracy, consistency and uniformity of multiple chambers, fine control of the coating and developing process of different photoresists, and overall particle pollutant control of the equipment.
天眼查信息显示,芯源微成立于2002年,是由中科院沈阳自动化研究所创建的国家高新技术企业,专业从事半导体生产设备的研发、生产、销售与服务,致力于为客户提供半导体装备与工艺整体解决方案。
It is reported that Xinyuanwei currently has a full order book, and the production hours have increased significantly compared with previous years. Xinyuanwei pointed out that the company's existing plant is already operating at full capacity, and the new plant is also under construction. It is planned to be put into use in the fourth quarter of 2021, which will play a very important role in increasing the company's production capacity.
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