Nagase Industries' Inkron invests in NIL materials and component development infrastructure

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Inkron, a NAGASE & CO. Group company and global leader in siloxane-based optically clear Nano-Imprint Lithography (NIL) materials, has made a strategic investment in NIL materials and component development infrastructure. This investment will significantly accelerate Inkron’s progress in developing high-performance optical materials required for key components in augmented reality (AR) glasses, 3D sensors, and other diffractive optical elements (DOEs). With this investment, Inkron will significantly enhance its ability to better provide customers with customized optical NIL materials with fast delivery times and improved performance. Inkron can now also provide component prototyping and low-volume production services to customers.

 

 

Figure 1. Nanoimprint diffractive structures imprinted on SCHOTT substrates using EVG tools and Inkron's high-refractive-index IOC resin.

 

 

Figure 2. EVG 7200 SmartNIL (R) UV nanoimprint lithography system

 

 

The most significant part of the investment is the purchase and installation of an EVG (R) 7200 UV NIL automation system from EV Group (EVG). The EVG 7200 system leverages EVG's innovative SmartNIL (R) technology and materials expertise to support mass production of micro- and nanoscale structures while achieving unparalleled quality. The system provides low-force and conformal imprinting, fast high-power exposure, and smooth imprint release, supporting unparalleled throughput and low cost of ownership. The EVG 7200 system with SmartNIL technology is ideally suited for mass production of next-generation photonic devices (including waveguides and DOEs) for applications such as AR and Virtual Reality (VR). In addition to these features, the tool, which has been delivered to Inkron, also offers a high-intensity UV station and heated chuck, and supports the use of soft UV-NIL materials for microlens molding applications.

 

Inkron offers NIL processing materials with a wide range of refractive indices, even down to 2.0. NIL materials complement coatings, gap filling and planarization coatings with refractive indices as low as 1.1. These material platforms, combined with the EVG 7200 system, provide an ideal infrastructure for the development of new optical components, optimizing resins and processes for special devices while accelerating delivery time. In addition to NIL equipment, Inkron has made significant investments in optical structure manufacturing and testing equipment, including equipment performance and reliability testing, and will continue to increase investments in this area. The company has established a dedicated team to support the Inkron NIL ecosystem, led by Vice President Dr. Janne Kylma, and includes materials scientists, lithography process engineers and photonics experts. Jukka Perento, Vice President of Operations at Inkron, is responsible for directing commercial NIL activities.

 

“Through the NILPhotonics Competence Center, EV Group collaborates with companies from across the photonics supply chain, such as Inkron, to accelerate the development of new devices and applications using our NIL technology and expertise,” said Markus Wimplinger, Director of Corporate Technology Development and IP at EV Group. “By partnering with Inkron, we have the opportunity to support them in the development of advanced photoresists that are critical to the production of next-generation optical devices.”

 

“We are excited to accelerate the development of our new optimized and innovative optical resin technologies. The new EVG 7200 system plays a vital role in this strategic move. These new capabilities will help us address our customers’ key performance issues and help them succeed,” said Jukka Perento. “Our nanoimprinted high-refractive index materials and matching gap-fill coatings, combined with EVG’s NIL systems, provide optical manufacturers with the critical wafer-level solutions they need to quickly scale up production of their latest developments.”

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