This instrument is very important in chip manufacturing
Wet electronic chemicals refer to various electronic chemical materials used in the wet process of microelectronics and optoelectronics (mainly including wet etching, cleaning, development, interconnection, etc.). According to their uses, they can be divided into general chemicals (also known as ultra-clean high-purity reagents) and functional chemicals (represented by photoresist supporting reagents).
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General Wet Electronic Chemicals
Determination of Hydrogen Peroxide Content by Ceric Sulfate Method
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Functional wet electronic chemicals
Developer-Tetramethylammonium hydroxide determination
Buffered Etching Solution - Ammonium Fluoride and Hydrofluoric Acid Determination
Aluminum etching solution - nitric acid, phosphoric acid, acetic acid
Titration of ternary mixed acid content
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Step 1: Using the redox method, use 0.1N ammonium ferrous sulfate to titrate HNO3Solvent: sulfuric acid-water (4:1)
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Step 2: Use acid-base titration to titrate H3PO4 and HAc using 0.5N NaOHUse saturated sodium chloride aqueous solution as solvent: V1 is the first H of nitric acid + phosphoric acid, V2 is the second H of HAc phosphoric acid
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DispenSix fully automatic sampling and online titration system
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