The physical concept of IGBT safe operating area and the failure mechanism of ultra-safe operating area

Publisher:CaptivatingGazeLatest update time:2011-12-21 Source: 21icKeywords:IGBT Reading articles on mobile phones Scan QR code
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1. Introduction
There are many reasons for the failure of semiconductor power devices. It is also very difficult and complicated to perform a replacement analysis after replacement. One of the main reasons for failure is the use beyond the safe operating area (SOA). Therefore, it is very important to fully understand the SOA and control the maximum DC current IC and collector-emitter voltage Vce of the IGBT within the SOA during use. SOA is divided into forward bias safe operating area (FBSOA), reverse bias safe operating area (RBSOA), switch safe operating area (SSOA) and short circuit safe operating area (SCSOA).
2. Physical concepts of each safe working area
The SOA of an IGBT indicates its ability to withstand high voltage and high current, and is an important indicator of reliability.
2.1 Forward Bias Safe Operating Area (FBSOA)
FBSO is within the active region of the output characteristic curve where Vge>threshold voltage Vth, as shown in Figure 1. The area surrounded by ABCDO in Figure 1 is the DC safe operating area. The AB segment is the maximum DC current Ic limited by tc=80℃. The product of IC and Vce corresponding to point B is equal to the maximum dissipated power Pcm. The BC segment is the equal power consumption line. The CD segment is the boundary of the safe operating area limited by the secondary breakdown, and this segment is not equal power consumption. As Vce increases, the power consumption decreases, and the higher the Vce, the lower the power consumption. This shows that failure is more likely to occur in high voltage and strong electric field states.
As shown in Figure 1, as the pulse width decreases, the SOA expands. What needs to be explained here is that the FBSOA given in the manual is in addition to the DCSOA. The pulse SOA under a certain pulse width is the single pulse safe operating area. Moreover, FBSOA only considers conduction losses, not switching losses. Therefore, FBSOA is only applicable to Class A, Class B and short-circuit working conditions of power amplifiers without switching losses. For continuous operation with a certain pulse width and duty cycle, its safe operating area should be determined using the calculation of the transient thermal resistance curve.
2.2 Reverse Bias Safe Operating Area (RBSOA)
RBSOA是表明在箝位电感负载时,在额定电压下关断最大箝位电感电流Ilm的能力。Ilm一般是最大DC额定电流的两倍,而额定电压接近反向击穿电压。PT型IGBT和NPT型IGBT的反偏安全工作区略有不同。PT型IGBT的RBSOA是梯形SOA,NPT型IGBT的RBSO是矩形SOA。如图2所示。可见NPT型IGBT。在额定电压下关断箝位电感电流的能力强于PT型IGBT。因此,PT型IGBT不适用于电感负载电路和马达驱动等电路,而且短路持续时间TSC较短,一般不给出短路安全工作区。所以,NPT型IGBT的可靠性高于PT型IGBT。
2.3 Switch Safe Operating Area (SSOA)

开关字全工作区如图3所示。由图2和图3可见,SSOA和RBSOA相似,都是矩形的。所不同的是RBSOA只考虑关断时承受高电压大电感电流的能力。SSOA不仅考虑关断状态,同时也考虑开启瞬间。所以SSOA兼顾FBSOA和RBSOA两种状态的考虑。另外,纵坐标的电流,RBSOA是Iim ;而SSOA是最大脉冲电流Icm。一个是最大箝位电感电流,一个是最大脉冲电流。而且两者在手册中给出的数值又是相等的。现在有的公司只给出SSOA,不再给出FBSOA和RBSOA。在IGBT开启时,往往是Vce没有降下来,Ic就达到负载电流Il。在有续流作用时还要达到Ic +Ir r m。Ir r m为续流二极管的最大反向恢复电流,因此导通过程也存在高压大电流状态。
2.4 Short Circuit Safe Operating Area (SCSOA)
SCSOA is when the C-E of the IGBT is under high voltage (rated reverse voltage), and an excessively high gate voltage Vg is suddenly added between G-E. The excessively high Vg and high conduction breakdown cause a short circuit state, and its short circuit current ISC can be as high as 10 times the rated current IC. This is similar to the on state of SSOA, but ISC>Icm. During the entire short circuit time Tsc, the IGBT is always in the on state. In this state, the energy consumption of the IGBT is the largest in the four safe operating areas, and the probability of failure is also the highest. SCSOA is shown in Figure 4.
3. Failure Mechanism of Hyper-SOA
As the safe operating area, it is safe to work within the SOA, and it will be unsafe or cause failure if it exceeds the SOA. Due to the different bias states of the four safe operating areas, the failure mechanism beyond the SOA is also different. The opening state of FBSOA, SCSOA and SSOA is forward biased, while RBSOA is reverse biased. It is well known that the main cause of IGBT failure is the latch-up of the parasitic SCR and the burnout caused by the super junction temperature tj operation.
(1)RBSOA的失效:在额定电压下关断箝位电感电流Ilm时,由于关断来自IGBT发射极的沟道电子电流,寄生PNP管发射极注入到高阻漂移区(PNP管的是基区)的少子空穴一部经过PNP管的基区从IGBT的发射极流出。当该空穴电流Ih在NPN管的基区电阻R b上压降Ih·R≥0.7V时,NPN管导通,其共基极放大系数αnpn迅速增大。同时由于PNP管的集电极处于高压,集电结耗尽层宽度(Xm)很宽,使PNP管的有效基区Wb变窄,α pnp也增大。当α npn+α pnp1时出现动态锁定而烧毁。因此直角安全区是IGBT可靠性的重要标志。由图2可见NPT型IGBT具有直角SOA,而PT型IGBT是梯形安全工作区。这说明PT型IGBT在额定电压下关断的箝位电感电流Ilm比NPT型IGBT要小。其抗高压大电流冲击能力和短路能力都不如NPT型IGBT。
The turn-off failure mechanism of SSOA is the same as that of RBSOA.
When FBSOA, SCSOA and SSOA are turned on, they all work in the high voltage and high current state in the active region. Because they are in forward bias, the instantaneous current is 2-10 times the DC rated current. The α npn and α pnp of the parasitic NPN and PNP tubes in the IGBT increase with the increase of the operating current. When α npn+α pnp1, static lock burnout occurs.
(2) Failure of SCSOA: Since the short-circuit current ISC may be as high as 10 times the DC rated current, the Joule heat generated during the short-circuit time TSC is excessive and cannot be dissipated in time, resulting in thermal burnout.
For example: 100A 1200V NPN IGBT, when TSC=10μs, the energy generated is:
ESC=Vce·Ic·Tsc=12 joules.
This energy is generated in the depletion layer Xm of the P-well PN junction, and the electric field in the depletion layer is ε=1200V/Xm. At this time, Xm (1200V) is about 200μm, so ε=6×104V/cm. Define εm≥3×104V/cm as a strong electric field. Now, the drift velocity of electrons in the strong electric field reaches saturation when ε>εm. The reason for saturation is the optical wave phonon scattering under the strong electric field, and the energy of the external electric field is transferred to the scattered lattice through the optical wave phonon scattering. Quantum physics puts forward a basic fact: "Although electrons in solids are moving at high speed between dense atoms, as long as these atoms are arranged in a strict periodicity, the high-speed movement of electrons does not suffer from scattering." The defects in Si single crystals and epitaxial wafers are the destruction of the periodic arrangement of the lattice. The scattering cross section of the part with a large defect density is large. At this time, the energy received from the external electric field is more, and the lattice vibration of this part is violent, which increases the lattice temperature t1. When t1 is greater than the melting point of silicon (1415°C), Si melt holes appear and burn out. This is why Si melt holes are found in all burned devices after dissection. Here we have made the above analysis of the burnout mechanism using the application exceeding SCSOA as an example. We have made the above analysis of the burnout mechanism using the application exceeding SCSOA as an example. For applications exceeding FBSOA, SSOA and RBSOA, as long as the ratio of the bias voltage to the depletion layer width Xm corresponding to the bias voltage is greater than 3×104V/cm, the above burnout may occur.
The dissection found that the area of ​​the Si melt hole A si is about 100μm2~1mm2. The lattice temperature is:
T1=Ic·Vce·Tsc/Dsi ·Csii·Asi·X m       (1)
Where Dsi and Csi are Si specific gravity and heat ratio respectively. Csi = 0.7 joules/gram °C, Dsi = 2.328 grams/cm3. We assume that 10% of the energy generated during the short-circuit time of 10μs is absorbed by the strong scattering area, and take Asi = 1mm2. Substituting the relevant data into (1) yields: t1 = 3600℃. This temperature is much higher than the melting point of Si, 1415℃. No wonder a melt hole appears in the Si wafer after burning.
4. Relationship between short circuit duration Tsc and gate voltage Vg and collector-emitter on-state voltage Vce(on) The larger the Tsc

Figure 5 shows the relationship curve of Tsc ~ Vce (on), and it can be seen that the larger the collector-emitter on-state voltage Vce (on), the longer Tsc. Figure 6 shows the relationship between Vg, Isc, and Tssc. It can be seen from Figure 6 that as Vg increases, Tsc decreases and Isc increases.

In terms of Si materials currently used in IGBT production, there are two types: epitaxial materials and high-resistance single crystal materials. IGBTs produced with epitaxial materials are called PT-IGBTs because the depletion layer punches through the high-resistance drift region during high-voltage breakdown. IGBTs produced with high-resistance single crystals are called NPT-IGBTs because the high-resistance drift region is thicker and is not punched through during high-voltage breakdown. From the perspective of the channel, there are two types: planar gate and trench. PT-IGBTs are further divided into PT, SPT (soft punch-through) and FS (field stop) IGBTs. PT, SPT and FS-IGBTs all have buffer layers, and FS is actually a buffer layer, and the electric field in the junction is a trapezoidal distribution. PT, SPT and FSIGBT can be made into planar gates or trench gates. Trench gates have a lower on-state voltage drop Vce(on). The maximum breakdown voltage of epitaxial PT-IGBT is 1200V. IGBTs above 1700V are mostly used for high-resistance single crystal materials, and their structure is NPT structure. NPT-IGBT can be made into a planar gate or a trench gate. The NPT structure with a buffer layer is also called FS-IGBT.
In terms of short-circuit capability, the manual does not give SCSOA for PT, SPT or FS-IGBT produced by epitaxial wafers. It cannot meet Isc/Ic=103Vg≥15V, and Tsc cannot reach 10μs at rated voltage. The Vce(on) of IGBT with this structure is a negative temperature coefficient, which is not suitable for parallel use, but suitable for switching power supply circuits. It is not suitable for motor drive circuits and voltage-type inverter circuits with short-circuit requirements. NPN-IGBT and trench gate field termination IGBT produced with high-resistance single crystal Si both give short-circuit rating SCSOA. When Tsc≤10μs, NPT-IGBT has Isc/Ic=10 at rated voltage, and trench gate field termination IGBT has Isc/Ic=4 when Tsc≤10μs. In addition to being related to the structure, Tsc is also related to the IGBT's own breakdown gm and the Vg used. Under the condition of a certain Vg, the larger the Gm, the higher the Isc and the shorter the Tsc. Without affecting the conduction loss, appropriately reducing Vg so that it does not enter the deep saturation region can reduce Isc and increase Tsc. The longer Tsc is, the easier it is to design the overcurrent protection circuit.
5. Discussion of Several Issues
5.1 How to evaluate the short-circuit capability of IGBT
The short-circuit safe operating area is actually a single-pulse operating state with a pulse width of Tsc. The power dissipation under a single pulse is
Psc= tj –tc/Zth (Tsc) (2)
where tj and tc are the junction temperature and case temperature respectively, and Zth (Tsc) is the single pulse transient thermal resistance of Tsc under the pulse width. When short-circuited:
Psc = Vce·Isc Substituting into (2) we get
Isc = t j –t c/Z th  (T sc)·Vce      (3)
或  Z th  (T sc) = t j –t c/Vce ·Isc    (4)
Figure 7 is the transient thermal resistance curve of 100A/1200V NPT-IGBT.
When Tsc is known, Zthjc can be calculated when the pulse width is Tsc. At this time, tj should be 150℃, tc=80℃, and substituting into (3) can be calculated under short circuit time. Zth (Tsc) under Vce and Ise can be calculated from (4). The pulse width Tsc can be found from Figure 7.
For example, when Tsc=10μ, Vce=1200V, tj=150℃ and tc=80℃, calculate the short circuit Ise that can be tolerated. From Figure 7, we can find that when Tsc=10μs, Zth (Tsc)=2.3×10-4℃/W, and substitute it into (3) to get: Ise=253.6A. If Ise=1000A, Vce=1200V, substitute it into <4> to get Zth (Tsc)=5.83×10-5℃/W, and from Figure 7, we can see that Tsc<10μs.
5.2 Discussion on the Higher Vce(on) and Longer
The Vce(on) of NTP-IGBT is greater than that of PT-IGBT. Under the same rated voltage and current, the main reason why the Vce(on) of NPT-IGBT is large is that its high-resistance drift region Wn is wide, and the corresponding depletion layer width Xm at the rated voltage does not completely penetrate Wn, that is, Wn>Xm. There is still a high-resistance region of a certain thickness. We can assume that the on-resistance Rce(on) of IGBT = Vce(on)/Ic. Under a certain Ic, the higher the Vce(on), the greater the Rce(on). This resistance is actually the longitudinal resistance of the tube base region of the parasitic PNP, which plays a role in equalizing the hole current injected from the PNP tube emitter region P+, so that the hole current flowing through the strong electric field region is more uniform, making the power density in the entire space charge region uniform, slowing down the generation of hot spots, and thus prolonging the short-circuit time Tsc. In addition, it increases sharply when overload or short circuit occurs. The voltage drop on Rce(on) increases. At this time, the voltage in the depletion layer Xm is Vce(on)-Ic ·Rce(on). Therefore, the larger Rce(on) (Vce(on)) is, the weaker the electric field in Xm is, the lower T1 is, and the longer Tsc is.
5.3 Why PT-IGBT cannot be used in motor drive circuits
The SCSOA is not given in the PT-IGBT manual. It is also not desirable to use it in a circuit with a short circuit. As mentioned above, the PT-IGBT is produced using a high-resistance thick epitaxial Si wafer. The high-resistance thick epitaxial is grown on a heavily doped P+ single crystal wafer through epitaxial technology to grow the N+ and N- epitaxial layers. The heavily doped P+ single crystal wafer itself has many defects, and a large number of stacking faults and dislocation epitaxial defects are introduced during the epitaxial growth process. Therefore, when the PT-IGBT works under high voltage (strong electric field) and high current, there are many strong scattering areas, which are prone to generate hot spots, and burnout occurs under a lower energy state. This means that the short-circuit time Tsc is closely related to the IGBT production materials, processes and structures.
6 Conclusion
The failure mechanism of semiconductor devices is a relatively complex issue, and is currently in the stage of deepening understanding. This article proposes the strong electric field mechanism for reference in the analysis only.
Keywords:IGBT Reference address:The physical concept of IGBT safe operating area and the failure mechanism of ultra-safe operating area

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