The 2021 National Intellectual Property Administration patent special research project involving high-end lithography machines was approved

On June 3, the General Office of the National Intellectual Property Administration issued a notice on the list of approved patent special research projects in 2021. The research projects involve intellectual property protection in the field of integrated circuits, patent analysis and research on quantum communication technology, optoelectronic integrated circuit industry, high-end lithography machine industry, semiconductor photoresist, etc.

Specifically, it includes research on intellectual property protection rules in the field of integrated circuits, and the project is undertaken by Zhongnan University of Economics and Law and the Intellectual Property Court of the Supreme People's Court; analysis and research on quantum communication technology patents, and the project is undertaken by the Communication Invention Examination Department of the Patent Office of the State Intellectual Property Office and the Beijing Institute of Quantum Information Science; analysis and research on optoelectronic integrated circuit industry patents, and the project is undertaken by Huazhong University of Science and Technology and Wuhan Optoelectronic Industrial Technology Research Institute Co., Ltd.; analysis and research on high-end lithography machine industry patents, and the project is undertaken by the Beijing Center for Patent Examination Cooperation of the Patent Office of the State Intellectual Property Office; analysis and research on semiconductor photoresist patents, and the project is undertaken by Nanjing University of Technology and Jiangsu Intellectual Property Protection Center