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Research progress of APC technology in etching process control

  • 2013-09-22
  • 259.55KB
  • Points it Requires : 2

Research Progress of APC Technology in Etching Process Control Wang Wei1, Wu Zhigang21 (Department of Optoelectronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065) 2 (School of Electronic Engineering, University of Electronic Science and Technology of China, Chengdu 610054) Abstract: APC is a multi-level control system, which includes real-time equipment and process control and non-real-time RtR control. The introduction of APC into plasma etching process control can greatly improve the utilization efficiency and product yield of plasma etcher, and meet the needs of the current development of deep submicron semiconductor process technology. In response to the needs of plasma etcher and its etching process control, this paper discusses the development trend of APC technology from two different levels: real-time control and RtR control. Keywords: plasma etching, APC, real-time feedback control, Run-to-Run control

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