Ion implantation technology for modifying the surface of materials is an important aspect of the development of materials science. This paper summarizes the characteristics, basic principles, and application effects of plasma source ion implantation technology. It also covers the development trend of plasma source ion implantation technology. For example, in addition to the good results achieved in metal alloys, unexpected results have also been achieved in semiconductor devices. In addition, important progress has been made in the research of composite surface modification layers.
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