pdf

Plasma source ion implantation technology and its applications

  • 2013-09-22
  • 151.61KB
  • Points it Requires : 2

Ion implantation technology for modifying the surface of materials is an important aspect of the development of materials science. This paper summarizes the characteristics, basic principles, and application effects of plasma source ion implantation technology. It also covers the development trend of plasma source ion implantation technology. For example, in addition to the good results achieved in metal alloys, unexpected results have also been achieved in semiconductor devices. In addition, important progress has been made in the research of composite surface modification layers.  

unfold

You Might Like

Uploader
jasionla
 

Recommended ContentMore

Popular Components

Just Take a LookMore

EEWorld
subscription
account

EEWorld
service
account

Automotive
development
circle

About Us Customer Service Contact Information Datasheet Sitemap LatestNews


Room 1530, 15th Floor, Building B, No.18 Zhongguancun Street, Haidian District, Beijing, Postal Code: 100190 China Telephone: 008610 8235 0740

Copyright © 2005-2024 EEWORLD.com.cn, Inc. All rights reserved 京ICP证060456号 京ICP备10001474号-1 电信业务审批[2006]字第258号函 京公网安备 11010802033920号
×