Fabrication of nickel cantilever beams using micro-electroforming: In order to design a conductive Ni micro-variable cross-section cantilever beam, a micro-electroforming process based on mature electroplating technology was used. After analyzing the variable cross-section structure of the cantilever beam and building a micro-electroforming test platform, the entire process was designed, and the cantilever beam was fabricated using near-ultraviolet thick-resist photolithography, Ni micro-electroforming, and sacrificial layer removal. The process experiment results show that there are no defects on the casting surface of the entire variable cross-section cantilever beam, but the casting thickness of the base, thick beam, and thin beam with different micro-electroforming areas is uneven. Among them, the base with the largest casting area has the thickest casting layer, the thick beam with the second largest area has a medium casting layer thickness, and the thin beam with the smallest area has the thinnest casting layer. Experiments have shown that increasing the duty cycle and reducing the current density within a certain range can suppress this uneven thickness phenomenon.
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