This paper introduces the research results of rapid thermal processing technology, including: RHT equipment, RTA mechanism and optimal RTA condition selection for high-dose silicon implantation, as well as RTP technologies such as shallow PN junction manufacturing, silicide formation, BP SG reflow and rapid nitridation of thin oxide layers.
You Might Like
Recommended ContentMore
Open source project More
Popular Components
Searched by Users
Just Take a LookMore
Trending Downloads
Trending ArticlesMore