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HX6408-VRM

Description
512k x 8 STATIC RAM
Categorystorage    storage   
File Size165KB,11 Pages
ManufacturerHoneywell
Websitehttp://www.ssec.honeywell.com/
Download Datasheet Parametric View All

HX6408-VRM Overview

512k x 8 STATIC RAM

HX6408-VRM Parametric

Parameter NameAttribute value
MakerHoneywell
Parts packaging codeDIE
package instructionDIE,
Contacts35
Reach Compliance Codeunknow
ECCN code3A001.A.2.C
Maximum access time25 ns
JESD-30 codeR-XUUC-N35
memory density4194304 bi
Memory IC TypeSTANDARD SRAM
memory width8
Number of functions1
Number of terminals35
word count524288 words
character code512000
Operating modeASYNCHRONOUS
Maximum operating temperature125 °C
Minimum operating temperature-55 °C
organize512KX8
Package body materialUNSPECIFIED
encapsulated codeDIE
Package shapeRECTANGULAR
Package formUNCASED CHIP
Parallel/SerialPARALLEL
Certification statusNot Qualified
Filter levelMIL-PRF-38535 Class V
Maximum supply voltage (Vsup)3.6 V
Minimum supply voltage (Vsup)3 V
Nominal supply voltage (Vsup)3.3 V
surface mountYES
technologyCMOS
Temperature levelMILITARY
Terminal formNO LEAD
Terminal locationUPPER
total dose100k Rad(Si) V
HX6408
Advanced Information
HX6408
512k x 8 STATIC RAM
The 512K x 8 Radiation Hardened Static RAM is a high
performance 524,288 word x 8-bit static random access
memory with optional industry-standard functionality. It is
fabricated with Honeywell’s radiation hardened Silicon On
Insulator (SOI) technology, and is designed for use in low
voltage systems operating in radiation environments. The
RAM operates over the full military temperature range and
requires only a single 3.3 V ± 0.3V power supply. Power
consumption is typically <30 mW @ 1MHz in write mode,
<14 mW @ 1MHz in read mode, and is less than 5 mW
when in standby mode.
Honeywell’s enhanced RICMOS™(Radiation Insensitive
CMOS) SOI V technology is radiation hardened through the
use of advanced and proprietary design, layout and process
hardening techniques.
The RICMOS™ V low power process is a SOI CMOS
technology with an 80 Å gate oxide and a minimum
drawn feature size of 0.35
µm.
Additional features
include tungsten via and contact plugs, Honeywell’s
proprietary SHARP planarization process and a lightly
doped drain (LDD) structure for improved short
channel reliability. A seven transistor (7T) memory cell
is used for superior single event upset hardening,
while three layer metal power busing and the low
collection volume SOI substrate provide improved
dose rate hardening.
FEATURES
Fabricated with RICMOS™ V
Silicon On Insulator (SOI)
0.35 mm Process (L
eff
= 0.28 µm)
Total Dose
3x10
5
and 1X10
6
rad(SiO
2
)
Neutron
≥1x10
cm
14
-2
No Latchup
Read/Write Cycle Times
≤20
ns, (3.3 V), -55 to 125°C
Typical Operating Power (3.3 V)
<14 mW @ 1MHz Read
<30 mW @ 1MHz Write
<5 mW Standby mode
Asynchronous Operation
CMOS Compatible I/O
Single Power Supply,
3.3 V ± 0.3 V
Operating Range is
-55°C to +125°C
36-Lead Flat Pack Package
Optional Low Power Sleep
Mode
Dynamic and Static Transient Upset
≥1x10
10
rad(Si)/s (3.3 V)
Dose Rate Survivability
≥1x10
12
rad(Si)/s
Soft Error Rate
≤1x10
-10
Upsets/bit-day (3.3 V)
1
www.honeywell.com

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Datasheet   0 1 2 3 4 5 6 7 8 9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
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