Entegris' new filtration products meet 65nm/45nm process requirements

shengdan

Entegris' new filtration products meet 65nm/45nm process requirements [Copy link]

Entegris announced the launch of its new Intercept Plus HPM filter product. The company said that Intercept technology has been patented and is the only filter in the semiconductor industry that uses dual-effect particle capture technology to maximize particle removal, shorten process startup time, improve process capability, and reduce chip defects.

This newly announced yield-enhancing technology is designed for advanced HF and BOE (hydrofluoric acid/buffered oxide etch) processes. Intercept Plus HPM technology provides an extremely clean product suitable for processes where DHF is the final step and offers a truly hydrophilic surface, eliminating the microscopic bubbles that are typically present in other filters that require pressurized wetting. Intercept Plus HPM is available in two versions: cartridge and disposable.

Entegris said that this technology is an ideal choice for advanced logic/flash memory manufacturers, as well as wet etching and cleaning machine manufacturers. Intercept Plus HPM filters are sub-micron filters that use both filtration and physical adsorption to remove particles, providing the filtration capacity required for 45nm process technology. These filter products provide more than 70% more filter membrane area than general products, extending filter life and increasing filter circulation tank turnover. The technology has recently been certified to comply with the European Union (EU) Restriction of Hazardous Substances (EU RoHS) and EU Packaging Directive ingredient requirements.